Aqua Mer Delivers Higher Yields And Better Performance
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| DI 320 laser imaged to 75 micron pitch (1.5 mil line and space.) |
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The
Aqua Mer family of dry film photoresists is the perfect solution for high yield innerlayer and outerlayer processing, and for laser direct imaging. Additionally, our photoresists allow manufacturers of all types to achieve their most creative goals. From ultra-fine line imaging for next generation prototypes, to tenting, etching, ablation, milling, forming and selective plating processes, Aqua Mer delivers. Supported by the service you expect from MacDermid, Aqua Mer is the choice for fabricators that require high performance and better process control.