Technology-Leading Liquid Photoresists.With The Technical Service You Can Count On.

MacDermid Microtrace is the advanced liquid photoresist designed specifically to produce higher yields and volume production at the lowest cost possible for inner layer imageformation. Supported by MacDermid’s comprehensive on-site technical service, fabricators can expect superior performance for any multilayer application.

Microtrace is the perfect solution for fabricating high density fine line circuitry in a high volume application. It generates accurate imaging below 75 micron pitch without compromising quality. It is compatible with any leading roller coating equipment line, making the transition from dry film extremely simple. Technically superior, Microtrace offers fast photospeed and exceptional stackability. When combined with our renowned service, increasing technology without losing yield is guaranteed.

For exceptional liquid photoresist chemistry and expert technical service, count on the company that says “Yes We Can.” MacDermid.

Key Features

• Fully aqueous processable
• Stackable after coating
• Excellent photospeed
• Superior printout image
• One year storage stability

Increase Technology Without Losing Yield.We Can Help.

Developed specifically for innerlayers, Microtrace is in the forefront of liquid photoresist technology. With proven solutions in place around the world, this advanced photoresist offers high yield, high volume production at a significantly reduced cost. It is compatible with both alkaline and acid etching chemistries and, unlike most liquid resists, Microtrace coated panels are stackable for over 48 hours. No matter what your need, MacDermid’s technical staff can help you increase yield where you need it most.